Kesan Rawatan Kriogenik Terhadap Struktur Antaramuka Ni/Si Dalam Peranti Silikon Sebagai Pengesan Foto [QC373.P9 Z21 2008 f rb].

Mohd Yusoff, Mohd Zaki (2008) Kesan Rawatan Kriogenik Terhadap Struktur Antaramuka Ni/Si Dalam Peranti Silikon Sebagai Pengesan Foto [QC373.P9 Z21 2008 f rb]. Masters thesis, Universiti Sains Malaysia.

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Abstract

Projek ini mengkaji kesan rawatan kriogenik terhadap struktur antaramuka Ni/Si dalam silikon sebagai pengesan foto. This project studied the effects of cryogenic treatment on Ni/Si interface in silicon device as a photodetector.

Item Type: Thesis (Masters)
Subjects: Q Science > QC Physics > QC350-467 Optics. Light
Divisions: Pusat Pengajian Sains Fizik (School of Physics) > Thesis
Depositing User: MHAH Hazlee Abdul Halil
Date Deposited: 11 Apr 2009 02:31
Last Modified: 22 Mar 2017 02:23
URI: http://eprints.usm.my/id/eprint/8960

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