Investigation of low dielectric constant (k) films for deep sub-micron CMOS application.

Cheon'g, Kuan Yew and Hussain, Luay Bakir (2007) Investigation of low dielectric constant (k) films for deep sub-micron CMOS application. Project Report. Universiti Sains Malaysia.

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Abstract

Silica (Si02) thin film on Si with low dielectric constant (k) properties has been systematically prepared and investigated. Two types of this low-k material have been deposited on Si via sol-gel spin-on coating. Filem nipis silika (Si02) yang berpemalar dieletrik rendah endap di atas Si tlah disediakan dan dikaji dengan sistematik. Dua jenis film nipis telah disediakan menggunkan pemutaran sol-gel.

Item Type: Monograph (Project Report)
Subjects: T Technology > TN Mining Engineering. Metallurgy > TN1-997 Mining engineering. Metallurgy
Divisions: Kampus Kejuruteraan (Engineering Campus) > Pusat Pengajian Kejuruteraan Bahan & Sumber Mineral (School of Material & Mineral Resource Engineering)
Depositing User: Mr Erwan Roslan
Date Deposited: 05 Jun 2009 03:39
Last Modified: 21 Sep 2017 03:16
URI: http://eprints.usm.my/id/eprint/10419

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