Inductively Coupled Plasma Etching On Gan

Rosli, Siti Azlina (2010) Inductively Coupled Plasma Etching On Gan. Masters thesis, USM.

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Abstract

Dalam projek ini, penyelidikan difokuskan kepada kajian tentang pengaruh pelbagai campuran plasma (H2 dan Ar) kepada Ch sebagai gas asas pada GaN menggunakan punaran kering khususnya punaran plasma yang digandingkan secara teraruh (ICP) untuk mendapatkan anisotropik yang tinggi In this project, the research mainly focused on the investigation of the influence of the various plasma mixtures (H2 and Ar) in Ch-based on GaN using dry etching majoring in Inductively Coupled Plasma etching to obtain highly anisotropic

Item Type:	Thesis (Masters)
Subjects:	Q Science > QC Physics > QC1 Physics (General)
Divisions:	Pusat Pengajian Sains Fizik (School of Physics) > Thesis
Depositing User:	Mr Firdaus Mohamad
Date Deposited:	24 Nov 2015 06:57
Last Modified:	22 Mar 2017 02:23
URI:	http://eprints.usm.my/id/eprint/29516

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