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Investigation of Low Dielectric Constant (k) Films for Deep Sub-Micron CMOS Application.

Cheon'g , Ir. Dr. Kuan Yew and Hussain, Assoc. Prof. Dr. Luay Bakir (2007) Investigation of Low Dielectric Constant (k) Films for Deep Sub-Micron CMOS Application. Project Report. Universiti Sains Malaysia.

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Abstract

Silica (Si02) thin film on Si with low dielectric constant (k) properties has been systematically prepared and investigated. Two types of this low-k material have been deposited on Si via sol-gel spin-on coating. Filem nipis silika (Si02) yang berpemalar dieletrik rendah endap di atas Si tlah disediakan dan dikaji dengan sistematik. Dua jenis film nipis telah disediakan menggunkan pemutaran sol-gel.

Item Type:Monograph (Project Report)
Subjects:T Technology > TN Mining Engineering. Metallurgy > TN1-997 Mining engineering. Metallurgy
ID Code:10419
Deposited By:Mr Erwan Roslan
Deposited On:05 Jun 2009 11:39
Last Modified:05 Jun 2009 11:39

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