Investigation of Low Dielectric Constant (k) Films for Deep Sub-Micron CMOS Application.

Cheon'g, Ir. Dr. Kuan Yew and Hussain, Assoc. Prof. Dr. Luay Bakir (2007) Investigation of Low Dielectric Constant (k) Films for Deep Sub-Micron CMOS Application. Project Report. Universiti Sains Malaysia.

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    Abstract

    Silica (Si02) thin film on Si with low dielectric constant (k) properties has been systematically prepared and investigated. Two types of this low-k material have been deposited on Si via sol-gel spin-on coating. Filem nipis silika (Si02) yang berpemalar dieletrik rendah endap di atas Si tlah disediakan dan dikaji dengan sistematik. Dua jenis film nipis telah disediakan menggunkan pemutaran sol-gel.

    Item Type: Monograph (Project Report)
    Subjects: T Technology > TN Mining Engineering. Metallurgy > TN1-997 Mining engineering. Metallurgy
    Divisions: Kampus Kejuruteraan (Engineering Campus) > Pusat Pengajian Kejuruteraan Bahan & Sumber Mineral (School of Material & Mineral Resource Engineering)
    Depositing User: Mr Erwan Roslan
    Date Deposited: 05 Jun 2009 11:39
    Last Modified: 13 Jul 2013 12:24
    URI: http://eprints.usm.my/id/eprint/10419

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