The Effect Of Implant Angle And Resist Shadowing In Submicron Implant Technology [QC702.7.I55 L478 2006 f rb].

Lee,, Kang Hai (2006) The Effect Of Implant Angle And Resist Shadowing In Submicron Implant Technology [QC702.7.I55 L478 2006 f rb]. Masters thesis, Universiti Sains Malaysia.

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    Abstract

    Dengan adanya peningkatan teknologi bagi industri fabrikasi litar terkamil (IC) ke tahap 90nm dan seterusnya, masih terdapat isu yang perlu ditimbangkan untuk technologi yang lebih rendah (0.13μm dan 0.22μm). As the integrated circuit (IC) fabrication industry gears up to volume manufacturing of 90nm technology node and beyond, there are issues still need to be addressed at the lower technology nodes such as 0.13μm and 0.22μm.

    Item Type: Thesis (Masters)
    Subjects: Q Science > QC Physics > QC501-766 Electricity and magnetism
    Divisions: UNSPECIFIED
    Depositing User: Mr Erwan Roslan
    Date Deposited: 08 May 2009 15:46
    Last Modified: 13 Jul 2013 12:15
    URI: http://eprints.usm.my/id/eprint/9830

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