Yusuf, Yusnizam and Wee, Kie Tang and Taib, Muhamad Ikram Md and Zainal, Norzaini
(2020)
Influence Of Molarity And Time Of Potassium Hydroxide Etching On Al-Rich AlGaN Layer.
In: 5th Meeting of Malaysia Nitrides Research Group (MNRG 2020), 1-2 December 2020.
Abstract
This work will describe the influence of molarity and time of potassium hydroxide etching on Al-rich AlGaN layer. With potassium hydroxide (KOH) molarity of 5
mol/L, no significant change on the pores formation was observed for 5 and 10 minutes of etching. Nonetheless, there was a possibilty that some of the Ga atoms were eliminated for 10 minutes of etching, resulting in co-existance of AlGaN material with higher Al content.
Similar behaviour was also witnessed in the case for 10 mol/L of KOH with 5 and 10 minutes of etching. Nonetheless, well-defined hexagonal patterns were only formed when the etching was conducted using 10 mol/L of KOH for 10 minutes. Such patterns have the potential to
increase light extraction efficiency of UV LEDs.
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