Effect Of Nucleation Time On GaN Layer Grown On Different Shape Of Patterned Sapphire Substrate

Taib, Muhamad Ikram Md and Zaini, Siti Nurul Waheeda Mohmad and Zainal, Norzaini (2020) Effect Of Nucleation Time On GaN Layer Grown On Different Shape Of Patterned Sapphire Substrate. In: 5th Meeting of Malaysia Nitrides Research Group (MNRG 2020), 1-2 December 2020.

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Abstract

This work describes the effect of nucleation time on GaN layer; which was grown separately on three different shape of patterned sapphire substrate (PSS); cone PSS and dome PSS. Prior to the GaN layer growth, a low temperature of GaN nucleation layer was initially grown at 40, 80 and 160 second. The nucleation islands became larger as the nucleation time was longer. Bigger islands promote better coalescence, while smaller islands showed otherwise. Besides, the GaN layer grown on bigger islands exhibit smoother surface. From XRD measurement, FWHM of the GaN peak decreased for longer nucleation time, indicating the benefit of bigger islands to reduce the dislocations in the layer through better coalescence. It was found that the GaN layer grown on dome-patterned substrate exhibits better quality than the one on cone-patterned substrate. The growth of GaN layer on flat sapphire was also performed for comparison.

Item Type: Conference or Workshop Item (Paper)
Subjects: Q Science > QC Physics > QC1-999 Physics
Divisions: Institut Penyelidikan dan Teknologi Nano Optoelektronik (Institute of Nano Optoelectronics Research and Technology (INOR)) > Conference or Workshop Item
Depositing User: Mr Aizat Asmawi Abdul Rahim
Date Deposited: 28 Apr 2021 03:10
Last Modified: 28 Apr 2021 03:10
URI: http://eprints.usm.my/id/eprint/49045

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