Effects of Substrate Temperature on the Properties of Indium Nitride Thin Films Grown on Flexible Prepared by Reactive Sputtering Method

Osman, Siti Aisyah and Lee, Zhi Yin and Fong, Chee Yong and Ng, Sha Shiong (2015) Effects of Substrate Temperature on the Properties of Indium Nitride Thin Films Grown on Flexible Prepared by Reactive Sputtering Method. In: 2nd Meeting of Malaysia Nitrides Research Group (MNRG 2015).

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Abstract

In this study, indium nitride (InN) thin films were deposited on kapton polymide flexible substrate by reactive radio frequency (RF) sputtering method using indium target in a mixture of Ar and N2 gases. The InN thin films were deposited under different substrate temperatures, i.e., 1 00°C and 200°C. The effects of substrate temperature on structural, surface morphologies and optical properties of InN thin films were systematically investigated by using X-ray diffraction technique, field emission scanning electron microscope, energy dispersive X-ray spectroscopy, and Fourier transform infrared spectroscopy.

Item Type: Conference or Workshop Item (Paper)
Subjects: Q Science > QC Physics > QC1-999 Physics
Divisions: Pusat Pengajian Sains Fizik (School of Physics) > Conference or Workshop Item
Depositing User: Mr Aizat Asmawi Abdul Rahim
Date Deposited: 31 Mar 2021 06:19
Last Modified: 31 Mar 2021 06:19
URI: http://eprints.usm.my/id/eprint/48735

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