The Effect Of Implant Angle And Resist Shadowing In Submicron Implant Technology

Lee, Kang Hai (2006) The Effect Of Implant Angle And Resist Shadowing In Submicron Implant Technology. Masters thesis, USM.

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    Abstract

    Dengan adanya peningkatan teknologi bagi industri fabrikasi litar terkamil (IC) ke tahap 90nm dan seterusnya, masih terdapat isu yang perlu ditimbangkan untuk technologi yang lebih rendah (0.13μm dan 0.22μm). As the integrated circuit (IC) fabrication industry gears up to volume manufacturing of 90nm technology node and beyond, there are issues still need to be addressed at the lower technology nodes such as 0.13μm and 0.22μm.

    Item Type: Thesis (Masters)
    Subjects: R Medicine > R Medicine (General) > R5-920 Medicine (General)
    Divisions: Kampus Kesihatan (Health Campus) > Pusat Pengajian Sains Perubatan (School of Medical Sciences) > Thesis
    Depositing User: Mr Firdaus Mohamad
    Date Deposited: 12 Aug 2015 14:57
    Last Modified: 15 May 2017 12:43
    URI: http://eprints.usm.my/id/eprint/29274

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