Lee, Kang Hai
(2006)
The Effect Of Implant Angle And Resist Shadowing In
Submicron Implant Technology.
Masters thesis, USM.
Abstract
Dengan adanya peningkatan teknologi bagi industri fabrikasi litar terkamil (IC) ke tahap 90nm dan seterusnya, masih terdapat isu yang perlu ditimbangkan
untuk technologi yang lebih rendah (0.13μm dan 0.22μm).
As the integrated circuit (IC) fabrication industry gears up to volume manufacturing of 90nm technology node and beyond, there are issues still need to be addressed at the lower technology nodes such as 0.13μm and 0.22μm.
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