Structural and optical properties of ZnO thin films deposited using atomic layer deposition technique

PPKBSM, Pusat Pengajian Bahan & Sumber Mineral (2011) Structural and optical properties of ZnO thin films deposited using atomic layer deposition technique. In: 3rd International Workshop on Nanotechnology & Application 2011, 10 – 12 November 2011, Vung Tau, Vietnam.

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    Abstract

    ZnO films have been successfully deposited by Atomic Layer Deposition (ALD) using Diethylzinc (DEZn) and water (H2O) as precursors.

    Item Type: Conference or Workshop Item (Paper)
    Subjects: T Technology > TN Mining Engineering. Metallurgy > TN1-997 Mining engineering. Metallurgy
    Divisions: Kampus Kejuruteraan (Engineering Campus) > Pusat Pengajian Kejuruteraan Bahan & Sumber Mineral (School of Material & Mineral Resource Engineering)
    Depositing User: Mr. HR
    Date Deposited: 02 Apr 2012 06:56
    Last Modified: 13 Jul 2013 17:59
    URI: http://eprints.usm.my/id/eprint/25179

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