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Structural and optical properties of ZnO thin films deposited using atomic layer deposition technique

PPKBSM, Pusat Pengajian Bahan & Sumber Mineral (2011) Structural and optical properties of ZnO thin films deposited using atomic layer deposition technique. In: 3rd International Workshop on Nanotechnology & Application 2011, 10 – 12 November 2011, Vung Tau, Vietnam.

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Abstract

ZnO films have been successfully deposited by Atomic Layer Deposition (ALD) using Diethylzinc (DEZn) and water (H2O) as precursors.

Item Type:Conference or Workshop Item (Paper)
Subjects:T Technology > TN Mining Engineering. Metallurgy > TN1-997 Mining engineering. Metallurgy
ID Code:25179
Deposited By:Mr. HR
Deposited On:02 Apr 2012 06:56
Last Modified:02 Apr 2012 15:04

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